LIMA Gen2
Precision mask alignment systems.
Semi-automatic alignment and uniform UV-LED exposure for samples ranging from 10 × 10 mm pieces to 6-inch wafers.
Compact 4-inch platform
LIMA-04
A semi-automatic photolithography system for piece samples and 4-inch wafers, featuring motorized alignment, camera-assisted imaging, and an electromechanical WEC mechanism.
- Microscope and camera alignment options
- Joystick-controlled semi-automatic motorized alignment
- Electromechanical WEC system
- Structure compatible with substrates of different mechanical properties
Sample range10 × 10 mm – 4 inch
Exposure area120 × 120 mm
Exposure uniformity< 3%
UV optionsUV300 / UV400
Large 6-inch platform
LIMA-06
Independent dual alignment microscopes, touchscreen control, and a large exposure area for academic and industrial processes.
- Independently moving dual alignment microscopes
- Joystick and touchscreen control
- Pneumatic WEC system
- Operation from piece samples to 6-inch wafers
Sample range10 × 10 mm – 6 inch
Exposure area160 × 160 mm
Exposure uniformity< 3%
UV optionsUV300 / UV400
Process results
Selected microstructures produced with the LIMA family.
Exposure system
Contact and UV options matched to your process.
Resolution depends on the photoresist, film thickness, substrate, mask, and process conditions. The highlighted performance and supported operating modes are therefore presented separately.
Supported contact modesHard · Soft · Vacuum · Proximity
Proximity operating range0–200 µm
Highlighted resolution — UV300< 1 µm · Hard Contact
Highlighted resolution — UV400< 2 µm · Hard Contact
Exposure sourceCompact UV-LED optical system
Detailed performance tableLIMA Gen2 datasheet ↗